Ellipsometer facility is a highly versatile and accurate instrument used in materials science, surface characterization, and thin film analysis. It employs the principle of ellipsometry, which measures changes in the polarization state of light reflected from a sample to determine its optical properties. By analyzing the ellipsometric parameters, the thickness, refractive index, and extinction coefficient of thin films and surface layers can be obtained. Ellipsometry is non-destructive and provides valuable information about film uniformity, surface roughness, and chemical composition. This facility is widely employed in research and industrial applications, including semiconductor manufacturing, solar cells, coatings, and nanotechnology, aiding in the design and characterization of advanced materials and devices.